Removal of model proteins using beams of argon ions, oxygen atoms and molecules: Mimicking the action of low-pressure Ar/O2 ICP discharges

Plasma Processes and Polymers

Volumn 6, Issue 4, 2009, Pages 255-261

  Kylián, Ondřej ^a,b   Benedikt, Jan ^c   Sirghi, Lucel ^a   Reuter, Rüdiger ^c   Rauscher, Hubert ^a   Von Keudell, Achim ^c   Rossi, François ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b CHARLES UNIVERSITY   (Czech Republic)

^c RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Beam experiments; ICP discharges; Plasma treatments; Proteins; Sterilisation

Indexed keywords

ARGON ION; BEAM EXPERIMENTS; CHEMICAL SPUTTERING; ENERGETIC ION; FLUENCES; ICP DISCHARGES; MODEL PROTEINS; OXYGEN ATOM; PLASMA TREATMENTS; PROTEIN REMOVAL; ROOM TEMPERATURE; STERILISATION;

ARGON; ATOMS; EXPERIMENTS; FREE RADICAL REACTIONS; INDUCTIVELY COUPLED PLASMA; IONS; MOLECULES; OXYGEN; PROTEINS; SURFACE ROUGHNESS;

ELECTRIC DISCHARGES;

EID: 67651208876     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800199     Document Type: Article

References (26)

1. D. M. Taylor, J. Hosp. Infection 1999, 43, S69.
2. D. M. Miller, I. Youkhana, W. U. Karunaratne, P. Pearce, Anaesthesia 2001, 56, 1069.
3. I. P. Lipscomb, A. K. Sihota, C. W. Keevil, J. Clin. Microbiol. 2006, 44, 3728.
4. M. Moisan, J. Barbeau, S. Moreau, J. Pelletier, M. Tabrizian, L'. H. Yahia, Int. J. Pharm. 2001, 226, 1.
5. S. Lerouge, M. Wertheimer, L'. H. Yahia, Plasmas Polym. 2001, 6, 175.
6. M. Laroussi, IEEE Trans. Plasma Sci. 2002, 30, 1409.
7. M. Laroussi, Plasma Process. Polym. 2005, 2, 391.
8. F. Rossi, O. Kylián, M. Hasiwa, Plasma Process. Polym. 2006, 3, 431.
9. O. Kylián,M. Hasiwa, F. Rossi, IEEE Trans. Plasma Sci. 2006, 34, 2606.
10. M. Hasiwa, O. Kylián, T. Hartung, F. Rossi, Innate Immunity 2008, 14, 89.
11. X. T. Deng, J. J. Shi, H. L. Chen, M. G. Kong, Appl. Phys. Lett. 2007, 90, 3904.
12. X. T. Deng, J. J. Shi, M. G. Kong, J. Appl. Phys. 2007, 101, 4701.
13. H. C. Baxter, G. A. Campbell, A. G. Whittaker, A. C. Jones, A. Aitken, A. H. Simpson, M. Casey, L. Bountiff, L. Gibbard, R. L. Baxter, J. Gen. Virol. 2005, 86, 2393.
14. H. C. Baxter, G. A. Campbell, P. R. Richardson, A. C. Jones, I. R. Whittle, M. Casey, A. G. Whittaker, R. L. Baxter, IEEE Trans. Plasma Sci. 2006, 34, 1337.
15. C. Bernard, A. Leduc, J. Bardeau, B. Saoudi, L'Y., Yahia, G. De Crescenzo, J. Phys. D: Appl. Phys. 2006, 39, 3470.
16. O. Kylián, H. Rauscher, D. Gilliland, F. Brétagnol, F. Rossi, J. Phys. D: Appl. Phys. 2008, 41, 5201.
17. K. Stapelmann, O. Kylián, B. Denis, F. Rossi, J. Phys. D: Appl. Phys. 2008, 41, 2005.
18. J. Opretzka, J. Benedikt, P. Awakowicz, J. Wunderlich, A. von Keudell, J. Phys. D: Appl. Phys. 2007, 40, 2826.
19. V. Raballand, J. Benedikt, J. Wunderlich, A. von Keudell, J. Phys. D: Appl. Phys. 2008, 41, 5207.
20. J. Benedikt, C. Flötgen, G. Kussel, V. Raballand, A. von Keudell, J. Phys.: Conf. Series 2008, 133, 012012.
21. F. C. Fehsenfeld, K. M. Evenson, H. P. Broida, Rev. Sci. Instrum. 1965, 36, 294.
22. A. R. de Souza, C. M. Mahlmann, J. J. Muzart, C. V. Speller, J. Phys. D: Appl. Phys. 1993, 26, 2164.
23. L. S. Yu-Jahnes, W. T. Brogan, A. C. Anderson, M. J. Cima, Rev. Sci. Instrum. 1992, 63, 4149.
24. C. Hopf, M. Schlüter, W. Jacob, Appl. Phys. Lett. 2007, 90, 224106.
25. C. Hopf, M. Schlüter, T. Schwarz-Selinger, U. von Toussaint, W. Jacob, New J. Phys. 2008, 10, 3022.
26. J. F. Friedrich, G. Kühn, J. Gähde, Acta Polym. 1979, 30, 470.