On the application of inductively coupled plasma discharges sustained in Ar/O2/N2 ternary mixture for sterilization and decontamination of medical instruments

Journal of Physics D: Applied Physics

Volumn 41, Issue 19, 2008, Pages

  Stapelmann, K ^a,b   Kylian O ^a   Denis, B ^a,b   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE (FLUID MECHANICS); ETCHING; INDUCTIVELY COUPLED PLASMA; MOLECULAR BIOLOGY; NANOSTRUCTURED MATERIALS; ORGANIC POLYMERS; OXYGEN; PHOTORESISTS; PLASMAS; RADIATION DECONTAMINATION; STERILIZATION (CLEANING); ULTRAVIOLET RADIATION;

ATOMIC OXYGEN; BACTERIAL SPORES; COUPLED PLASMAS; ETCHING RATES; HIGH POTENTIAL; LOW PRESSURE; MEDICAL DEVICES; NON-EQUILIBRIUM; ONE-STEP PROCESSES; OPTIMAL CONDITIONS; PLASMA DISCHARGES; UV RADIATION;

ELECTRIC DISCHARGES;

EID: 53349144005     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/19/192005     Document Type: Article

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