Fluorination mechanisms of Al2 O3 and Y2 O3 surfaces irradiated by high-density C F4 / O 2 and S F6 / O2 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 4, 2009, Pages 831-835

  Miwa, Kazuhiro ^a   Takada, Noriharu ^a   Sasaki, Koichi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING ENERGIES; HIGH-DENSITY; PLASMA-INDUCED; REACTION PROBABILITY;

DEPOSITS; FLUORINATION; FLUORINE; HALOGENATION; ION BOMBARDMENT; IONS; PLASMAS; SULFUR;

ALUMINUM;

EID: 67650305938     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3112624     Document Type: Article

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