Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 4, 2009, Pages 900-906

  Kim, Youngsoo ^a   Lee, Ji Hye ^a   Kim, Kang Jin ^a   Lee, Yeonhee ^b  

^a Korea University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; FLUOROCARBON FILMS; FLUOROCARBON GAS; FLUOROCARBON THIN FILMS; GAS RATIO; HYDROPHOBIC PROPERTIES; HYDROPHOBIC SURFACES; HYDROPHOBIC THIN FILMS; INDUCTIVELY-COUPLED; PLASMA POWER; POLYMERIZATION METHOD; PROCESS PARAMETERS; PULSED PLASMA; SCANNING ELECTRON MICROSCOPE; SI SUBSTRATES; SURFACE CHARACTERIZATION; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF-SIMS ANALYSIS; UNSATURATED HYDROCARBONS; WATER CONTACT ANGLE MEASUREMENT; XPS;

ANGLE MEASUREMENT; CONTACT ANGLE; EMISSION SPECTROSCOPY; FIELD EMISSION; FLUORINE; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL GROUPS; HYDROCARBONS; HYDROPHOBICITY; INDUCTIVELY COUPLED PLASMA; PLASMA POLYMERIZATION; POLYMER BLENDS; POLYMERS; PUMPING PLANTS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SURFACE CHEMISTRY; THIN FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67650290306     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3136763     Document Type: Article

References (30)

1. Jay J. Senkevich and David W. Sherrer II, J. Vac. Sci. Technol. A 0734-2101 18, 377 (2000). 10.1116/1.582196
2. J. E. Chase and F. J. Boerio, J. Vac. Sci. Technol. A 0734-2101 21, 607 (2003). 10.1116/1.1564028
3. H. Yasuda, Plasma Polymerization (Academic, Orlando, FL, 1985).
4. R. d'Agostino, F. Cramarossa, F. Fracassi, and F. Illuzzi, in Plasma Deposition, Treatment, and Etching of Polymers, edited by, R. d'Agostino, (Academic, San Diego, 1990), pp. 95-162.
5. H. Yasuda and Q. Yu, Plasma Chem. Plasma Process. 0272-4324 24, 325 (2004). 10.1023/B:PCPP.0000013204.17559.72
6. K. Endo, K. Shinoda, and T. Tatsumi, J. Appl. Phys. 0021-8979 86, 2739 (1999). 10.1063/1.371119
7. K. K. Lee, B. Bhusham, and D. Hansford, J. Vac. Sci. Technol. A 0734-2101 23, 804 (2005). 10.1116/1.1861939
8. K. W. Oh, A. Shekhar, and C. H. Ahn, J. Micromech. Microeng. 0960-1317 12, 187 (2002). 10.1088/0960-1317/12/2/313
9. R. d'Agostino, P. Favia, F. Fracassi, and F. Illuzzi, J. Polym. Sci., Part A: Polym. Chem. 0887-624X 28, 3387 (1990). 10.1002/pola.1990.080281217
10. L. Zheng, L. Ling, X. Hua, G. Oehrlein, and E. A. Hudson, J. Vac. Sci. Technol. A 0734-2101 23, 634 (2005). 10.1116/1.1931680
11. C. B. Labelle, R. Opila, and A. Kornblit, J. Vac. Sci. Technol. A 0734-2101 23, 190 (2005). 10.1116/1.1830496
12. P. Favia, V. H. Perez-Luna, T. Boland, D. G. Castner, and B. D. Ratner, Plasmas Polym. 1084-0184 1, 299 (1996). 10.1007/BF02532828
13. R. W. Jaszewski, H. Schift, B. Schnyder, A. Schneuwly, and P. Gröning, Appl. Surf. Sci. 0169-4332 29, 729 (1999).
14. E. Kay, A. Dilks, and U. Hetzler, J. Macromol. Sci., Part A: Pure Appl. Chem. 12, 1393 (1978). 10.1080/00222337808063200
15. E. Kay and A. Dilks, J. Vac. Sci. Technol. 0022-5355 16, 428 (1979). 10.1116/1.569966
16. Y. Iriyama and H. Yasuda, J. Polym. Sci., Part A: Polym. Chem. 0887-624X 30, 1731 (1992). 10.1002/pola.1992.080300826
17. A. J. Bariya, H. Shan, C. W. Frank, S. A. Self, and J. P. McVittie, J. Vac. Sci. Technol. B 1071-1023 9, 1 (1991). 10.1116/1.585784
18. E. Kay and A. Dilks, Thin Solid Films 0040-6090 78, 309 (1981). 10.1016/0040-6090(81)90033-X
19. R. D'Agostino, F. Cramaroza, F. Fracassi, E. Desimoni, L. Sabbatini, P. G. Zambonin, and G. Caporiccio, Thin Solid Films 0040-6090 143, 163 (1986). 10.1016/0040-6090(86)90384-6
20. D. F. O'Kane and D. W. Rice, J. Macromol. Sci., Part A: Pure Appl. Chem. 10, 567 (1976). 10.1080/00222337608061200
21. J. -H. Wang, J. -J. Chen, and R. B. Timmons, Chem. Mater. 0897-4756 8, 2212 (1996). 10.1021/cm960181x
22. C. I. Butoi, N. M. Mackie, J. L. Barnd, E. R. Fisher, L. J. Gamble, and D. G. Castner, Chem. Mater. 0897-4756 11, 862 (1999). 10.1021/cm981081p
23. V. Yanev, S. Krischok, A. Opitz, H. Wurmus, J. A. Schaefer, N. Schwesinger, and S. -I.-U. Ahmed, Surf. Sci. 0039-6028 566-568, 1229 (2004). 10.1016/j.susc.2004.06.096
24. E. J. Winder and K. K. Gleason, J. Appl. Polym. Sci. 0021-8995 78, 842 (2000). 10.1002/1097-4628(20001024)78:4<842::AID-APP180
25. M. D. Garrison, R. Liginbühl, R. M. Overney, and B. D. Ratner, Thin Solid Films 0040-6090 352, 13 (1999). 10.1016/S0040-6090(98)01733-7
26. H. He and M. F. Thorpe, Phys. Rev. Lett. 0031-9007 54, 2107 (1985). 10.1103/PhysRevLett.54.2107
27. G. H. Döhler, R. Dandoloff, and H. Bilz, J. Non-Cryst. Solids 0022-3093 42, 87 (1980). 10.1016/0022-3093(80)90010-1
28. S. Tajima and K. Komvopoulos, J. Phys. Chem. C 1932-7447 111, 4358 (2007). 10.1021/jp067521e
29. L. J. Bellamy and R. F. Branch, Nature (London) 0028-0836 173, 633 (1954). 10.1038/173633b0
30. N. B. Colthup, L. H. Daly, and S. E. Wiberley, Introduction to Infrared and Raman Spectroscopy, 3rd ed. (Academic, New York, 1990.