Creation of polymerizable species in plasma polymerization

Plasma Chemistry and Plasma Processing

Volumn 24, Issue 2, 2004, Pages 325-351

  Yasuda, Hirotsugu ^a   Yu, Qingsong ^a  

^a University of Missouri   (United States)

Author keywords

Low pressure glow discharge; Plasma assisted CVD; Plasma CVD; Plasma enhanced CVD; Plasma glow; Plasma polymerization

Indexed keywords

LOW-PRESSURE GLOW DISCHARGE; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; PLASMA CHEMICAL VAPOR DEPOSITION; PLASMA GLOW;

ARGON; CATHODES; DISSOCIATION; ELECTRON TUBES; GLOW DISCHARGES; IONIZATION; MONOMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VAPOR DEPOSITION;

PLASMA POLYMERIZATION;

EID: 3543124096     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:PCPP.0000013204.17559.72     Document Type: Article

References (25)

1. G. Francis, The glow discharge at low pressure, in Handbuch der Physik, Vol. 22 (S. Flügge, ed.), Springer, Berlin, Germany, 1956, pp. 53-208.
2. A. M. Howatson, An Introduction to Gas Discharges, 2nd ed., Pergamon Press, New York, 1976.
3. H. K. Yasuda and Q. S. Yu, J. Vac. Sci. Technol., A19(3), 773-781 (2001).
4. Qingsong Yu, C. E. Moffitt, D. M. Wieliczka, and H. Yasuda, J. Vac. Sci. Technol. A19(5), 2163-2167 (2001).
5. H. Yasuda, Plasma Polymerization, Academic Press, San Diego, CA, 1985.
6. J. G. Zhao and H. K. Yasuda, J. Vacuum Sci. Technol. 18(5), 2062-2066 (2000).
7. W. H. Tao and Hirotsugu K. Yasuda, Plasma Chem. Plasma Process. 22(2), 313 (2002).
8. B. Chapman, Glow Discharge Processes, Wiley, New York, 1980.
9. Q. S. Yu and H. K. Yasuda, J. Polym. Sci. Polym. Chem. Ed. 37, 967-982 (1999).
10. Qingsong Yu, C. E. Moffitt, D. M. Wieliczka, J. Deffeyes, and H. Yasuda, Prog. Org. Coat. 44, 37 (2002).
11. H. K. Yasuda, Q. S. Yu, C. M. Reddy, C. E. Moffitt, and D. M. Wieliczka, J. Appl. Polym. Sci. 85(7), 1387 (2002).
12. H. K. Yasuda, Q. S. Yu, C. M. Reddy, C. E. Moffitt, and D. M. Wieliczka, J. Appl. Polym. Sci. 85(7), 1443 (2002).
13. F. F. Oldfield, D. L. Cowan, and H. K. Yasuda, Plasmas Polym. 5(3/4), 235-253 (2000).
14. F. F. Oldfield, D. L. Cowan, and H. K. Yasuda, Plasmas Polym. 6, 51-69 (2001).
15. H. Kobayashi, M. Shen, and A. T. Bell, J. Macromol. Sci. Chem. A8, 1354 (1974).
16. Q. S. Yu and H. K. Yasuda, J. Polym. Sci.: Part A: Polym. Chem. 36, 1583 (1998).
17. M. M. Millard and E. Kay, J. Electrochem. Soc. 129, 161 (1982).
18. S. P. Fusselman and H. K. Yasuda, Plasma Chem. Plasma Process. 14, 251 (1994).
19. Q. S. Yu and H. K. Yasuda, Plasma Chem. Plasma Process. 18, 461 (1998).
20. F. Cramarossa, S. De Benedictis, and G. Ferraro, J. Quant. Spectrosc. Radiat. Trans. 23, 291 (1980).
21. R. D'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro, Plasma Chem. Plasma Process 1, 19 (1981).
22. A. Pastol and Y. Catherine, J. Phys. D 23, 799 (1990).
23. J. W. Coburn and M. Chen, J. Appl. Phys. 51, 3134 (1980).
24. T. Yasuda, T. Okuno, M. Miyama, and H. Yasuda, J. Polym. Sci.: Part A: Polym. Chem. 32, 1829 (1994).
25. E. Krentsel, S. Fusselman, H. Yasuda, T. Yasuda, and M. Miyama, J. Polym. Sci.: Part A: Polym. Chem. 32, 1839 (1994).