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Volumn 24, Issue 2, 2009, Pages 140-144

Influence of the sample morphology on total reflection X-ray fluorescence analysis

Author keywords

Absorption effects; Quantification; TXRF

Indexed keywords

ABSORPTION EFFECTS; ABSORPTION PHENOMENA; FLUORESCENCE INTENSITIES; LINEAR CALIBRATION; QUALITATIVE AND QUANTITATIVE ANALYSIS; QUANTIFICATION; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; TXRF;

EID: 67650091708     PISSN: 08857156     EISSN: 19457413     Source Type: Journal    
DOI: 10.1154/1.3131804     Document Type: Article
Times cited : (7)

References (25)
  • 1
    • 84876657065 scopus 로고    scopus 로고
    • Austrian Center of Competence for Tribology (ACT). (), accessed 8 April 2009.
    • Austrian Center of Competence for Tribology (ACT) (2009). (http://www.ac2t.at/), accessed 8 April 2009.
    • (2009)
  • 2
    • 0000550536 scopus 로고    scopus 로고
    • Pattern formation in drying drops
    • 1063-651X,. 10.1103/PhysRevE.61.475
    • Deegan, R. D. (2000a). " Pattern formation in drying drops.," Phys. Rev. E 1063-651X 61, 475-485. 10.1103/PhysRevE.61.475
    • (2000) Phys. Rev. e , vol.61 , pp. 475-485
    • Deegan, R.D.1
  • 3
    • 0034224710 scopus 로고    scopus 로고
    • Contact line deposits in an evaporating drop
    • " 1063-651X,. 10.1103/PhysRevE.62.756
    • Deegan, R. D., Bakajin, O., Dupont, T. F., Huber, G., Nagel, S. R., and Witten, T. A. (2000b). " Contact line deposits in an evaporating drop.," Phys. Rev. E 1063-651X 62, 756-765. 10.1103/PhysRevE.62.756
    • (2000) Phys. Rev. e , vol.62 , pp. 756-765
    • Deegan, R.D.1    Bakajin, O.2    Dupont, T.F.3    Huber, G.4    Nagel, S.R.5    Witten, T.A.6
  • 4
    • 67650039285 scopus 로고    scopus 로고
    • edited by Bubert, H. and Jenett, H. (Wiley, Weinheim)
    • Fabry, L. and Pahlke, S. (2002). Surface and Thin Film Analysis, edited by, Bubert, H., and, Jenett, H., (Wiley, Weinheim), pp. 181-193.
    • (2002) Surface and Thin Film Analysis , pp. 181-193
    • Fabry, L.1    Pahlke, S.2
  • 6
    • 4644293541 scopus 로고    scopus 로고
    • Validation of vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers
    • ",. 10.1016/j.sab.2004.03.011 0584-8547
    • Hellin, D., Rip, J., Arnauts, S., De Gendt, S., Mertens, P. W., and Vinckier, C. (2004b). " Validation of vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers.," Spectrochim. Acta, B At. Spectrosc. 59, 1149-1157. 10.1016/j.sab.2004.03.011 0584-8547
    • (2004) Spectrochim. Acta, B At. Spectrosc. , vol.59 , pp. 1149-1157
    • Hellin, D.1    Rip, J.2    Arnauts, S.3    De Gendt, S.4    Mertens, P.W.5    Vinckier, C.6
  • 7
    • 22544465830 scopus 로고    scopus 로고
    • Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers
    • " 0267-9477,. 10.1039/b502208h
    • Hellin, D., Rip, J., Geens, V., Delande, T., Conard, T., Gendt, S. D., and Vinckier, C. (2005). " Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers.," J. Anal. At. Spectrom. 0267-9477 20, 652-658. 10.1039/b502208h
    • (2005) J. Anal. At. Spectrom. , vol.20 , pp. 652-658
    • Hellin, D.1    Rip, J.2    Geens, V.3    Delande, T.4    Conard, T.5    Gendt, S.D.6    Vinckier, C.7
  • 9
    • 67650041687 scopus 로고
    • IAEA. (IAEA, Vienna).
    • IAEA (1995). QXAS, AXIL Version (IAEA, Vienna).
    • (1995) QXAS, AXIL Version
  • 11
    • 84926825729 scopus 로고
    • Atomic radiative and radiationless yields for K and L shells
    • 0047-2689.
    • Krause, M. O. (1979). " Atomic radiative and radiationless yields for K and L shells.," J. Phys. Chem. Ref. Data 0047-2689 8, 307-327.
    • (1979) J. Phys. Chem. Ref. Data , vol.8 , pp. 307-327
    • Krause, M.O.1
  • 12
    • 33747375483 scopus 로고    scopus 로고
    • edited by Van Grieken, R. and Markowicz, A. (Marcel Dekker, New York)
    • Kregsamer, P., Streli, C., and Wobrauschek, P. (2001). Handbook of X-ray Spectrometry, edited by, Van Grieken, R., and, Markowicz, A., (Marcel Dekker, New York), pp. 559-602.
    • (2001) Handbook of X-ray Spectrometry , pp. 559-602
    • Kregsamer, P.1    Streli, C.2    Wobrauschek, P.3
  • 14
    • 67650024610 scopus 로고
    • Compilation of X-Ray Cross Sections, Section II Revision I (Report No. UCRL-50174). Livermore, CA: Lawrence Livermore National Laboratory.
    • McMaster, W. H., Del Grande, N. K., Mallett, J. H., and Hubbell, J. H. (1969). Compilation of X-Ray Cross Sections, Section II Revision I (Report No. UCRL-50174). Livermore, CA: Lawrence Livermore National Laboratory.
    • (1969)
    • McMaster, W.H.1    Del Grande, N.K.2    Mallett, J.H.3    Hubbell, J.H.4
  • 15
    • 84876652801 scopus 로고    scopus 로고
    • NanoFocus, Inc..), accessed 8 April 2009.
    • NanoFocus, Inc. (2009). (http://www.nanofocus.de/usurf-explorer.html? &L=1), accessed 8 April 2009.
    • (2009)
  • 16
    • 0346331015 scopus 로고    scopus 로고
    • Quo Vadis total reflection X-ray fluorescence?
    • 10.1016/S0584-8547(03)00193-9 0584-8547
    • Pahlke, S. (2003). " Quo Vadis total reflection X-ray fluorescence? " Spectrochim. Acta, B At. Spectrosc. 58, 2025-2038. 10.1016/S0584-8547(03) 00193-9 0584-8547
    • (2003) Spectrochim. Acta, B At. Spectrosc. , vol.58 , pp. 2025-2038
    • Pahlke, S.1
  • 17
    • 0035976301 scopus 로고    scopus 로고
    • Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF state-of-the-art'
    • ",. 10.1016/S0584-8547(01)00312-3 0584-8547
    • Pahlke, S., Fabry, L., Kotz, L., Mantler, C., and Ehmann, T. (2001). " Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF state-of-the-art'.," Spectrochim. Acta, B At. Spectrosc. 56, 2261-2274. 10.1016/S0584-8547(01)00312-3 0584-8547
    • (2001) Spectrochim. Acta, B At. Spectrosc. , vol.56 , pp. 2261-2274
    • Pahlke, S.1    Fabry, L.2    Kotz, L.3    Mantler, C.4    Ehmann, T.5
  • 18
    • 41349123659 scopus 로고    scopus 로고
    • Evaporative deposition patterns: Spatial dimensions of the deposit
    • 1063-651X,. 10.1103/PhysRevE.71.036313
    • Popov, Y. O. (2005). " Evaporative deposition patterns: Spatial dimensions of the deposit.," Phys. Rev. E 1063-651X 71, 1-17. 10.1103/PhysRevE.71.036313
    • (2005) Phys. Rev. e , vol.71 , pp. 1-17
    • Popov, Y.O.1
  • 19
    • 0001563076 scopus 로고
    • Trace element analysis using total-reflection X-ray fluorescence spectrometry
    • 0376-0308.
    • Prange, A. and Schwenke, H. (1992). " Trace element analysis using total-reflection X-ray fluorescence spectrometry.," Adv. X-Ray Anal. 0376-0308 35, 899-923.
    • (1992) Adv. X-Ray Anal. , vol.35 , pp. 899-923
    • Prange, A.1    Schwenke, H.2
  • 20
    • 0001691598 scopus 로고
    • Exchange corrections of K x-ray emission rates
    • 1049-250X.
    • Scofield, J. A. (1974). " Exchange corrections of K x-ray emission rates.," Adv. At., Mol., Opt. Phys. 1049-250X 9, 1041-1049.
    • (1974) Adv. At., Mol., Opt. Phys. , vol.9 , pp. 1041-1049
    • Scofield, J.A.1
  • 21
    • 0001606762 scopus 로고
    • Theoretical calculation of fluorescent X-ray intensity in fluorescent x-ray petrochemical analysis Japan
    • 0021-4922,. 10.1143/JJAP.5.886
    • Shiraiwa, T. and Fujino, N. (1966). " Theoretical calculation of fluorescent X-ray intensity in fluorescent x-ray petrochemical analysis Japan.," Jpn. J. Appl. Phys. 0021-4922 5, 886-899. 10.1143/JJAP.5.886
    • (1966) Jpn. J. Appl. Phys. , vol.5 , pp. 886-899
    • Shiraiwa, T.1    Fujino, N.2
  • 22
    • 0033521370 scopus 로고    scopus 로고
    • Review on grazing incidence X-ray spectrometry and reflectometry
    • 10.1016/S0584-8547(98)00160-8 0584-8547
    • Stoev, K. N. and Sakurai, K. (1999). " Review on grazing incidence X-ray spectrometry and reflectometry.," Spectrochim. Acta, B At. Spectrosc. 54, 41-82. 10.1016/S0584-8547(98)00160-8 0584-8547
    • (1999) Spectrochim. Acta, B At. Spectrosc. , vol.54 , pp. 41-82
    • Stoev, K.N.1    Sakurai, K.2
  • 23
    • 34548737574 scopus 로고    scopus 로고
    • Total reflection x-ray fluorescence analysis-a review
    • 10.1002/xrs.985 0049-8246
    • Wobrauschek, P. (2007). " Total reflection x-ray fluorescence analysis-a review.," XRay Spectrom. 36, 289-300. 10.1002/xrs.985 0049-8246
    • (2007) XRay Spectrom. , vol.36 , pp. 289-300
    • Wobrauschek, P.1
  • 24
    • 0011820007 scopus 로고
    • Recent developments and results in total reflection X-ray fluorescence analysis
    • " 0376-0308.
    • Wobrauschek, P., Kregsamer, P., Streli, C., and Aiginger, H. (1991). " Recent developments and results in total reflection X-ray fluorescence analysis.," Adv. X-Ray Anal. 0376-0308 34, 1-12.
    • (1991) Adv. X-Ray Anal. , vol.34 , pp. 1-12
    • Wobrauschek, P.1    Kregsamer, P.2    Streli, C.3    Aiginger, H.4


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