"Etching under the corner" - Inclined macropores by reactive ion etching

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 6, 2009, Pages 1245-1249

  Grigoras, Kestutis ^a   Franssila, Sami ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENIC TEMPERATURES; DEEP REACTIVE ION ETCHING; ETCHED PORES; ETCHING PARAMETERS; MACROPORE FORMATION; MACROPORES; NONUNIFORMITY; SILICON OXIDE LAYERS;

ALUMINA; IONS; SILICON COMPOUNDS; SILICON OXIDES;

REACTIVE ION ETCHING;

EID: 67649972126     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200881066     Document Type: Article

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