Tuning the Er3+ sensitization by Si nanoparticles in nanostructured as-grown Al2 O3 films

Journal of Applied Physics

Volumn 105, Issue 1, 2009, Pages

  Nuez Sanchez S ^a   Serna, R ^a   López, J García ^b   Petford Long, A K ^c   Tanase, M ^c   Kabius, B ^c  

^a INSTITUTO DE ÓPTICA   (Spain)

^b CENTRO NACIONAL DE ACELERADORES   (Spain)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; AS-GROWN; CHARACTERISTIC DISTANCE; CONTROLLED THICKNESS; DEVICE PERFORMANCE; DOPANT DISTRIBUTION; EFFECTIVE DIAMETER; NANO SCALE; NANO-METER-SCALE; NANO-STRUCTURED; NANOSTRUCTURED FILMS; OPTIMIZED CONFIGURATION; POST ANNEALING TREATMENT; SI NANOPARTICLES;

ALUMINUM; ENERGY TRANSFER; ERBIUM; IONS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; SILICON; TUNING;

AMORPHOUS SILICON;

EID: 67649791120     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3065520     Document Type: Article

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