Structural and electrical properties of thin SrHfON films for high- k gate dielectric

Applied Physics Letters

Volumn 94, Issue 25, 2009, Pages

  Feng, Li Ping ^a   Liu, Zheng Tang ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION TEMPERATURE; EFFECTIVE WORK FUNCTION; GATE STACKS; HIGH DIELECTRIC CONSTANTS; HIGH-K GATE DIELECTRICS; N2 AMBIENT; ORDERS OF MAGNITUDE; POLYCRYSTALLINE; REACTIVE CO-SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES;

DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; GATES (TRANSISTOR); HAFNIUM; HAFNIUM COMPOUNDS;

GATE DIELECTRICS;

EID: 67649616856     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3152779     Document Type: Article

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