Suppression of aliasing in multi-sensor scanning absolute profile measurement

Optics Express

Volumn 17, Issue 13, 2009, Pages 11098-11106

  Wiegmann, Axel ^a   Schulz, Michael ^a   Elster, Clemens ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-ALIASING;

ALIASING; INTERFEROMETRIC MEASUREMENT; MULTI SENSOR; NYQUIST FREQUENCY; PROFILE MEASUREMENT; SCANNING TECHNIQUES; SINUSOIDAL WAVE;

SCANNING;

ALGORITHM; ARTICLE; COMPUTER SIMULATION; IMAGE PROCESSING; INSTRUMENTATION; INTERFEROMETRY; METHODOLOGY; OPTICS; REFRACTOMETRY; STATISTICAL MODEL; SYNCHROTRON;

ALGORITHMS; COMPUTER SIMULATION; IMAGE PROCESSING, COMPUTER-ASSISTED; INTERFEROMETRY; MODELS, STATISTICAL; OPTICS AND PHOTONICS; REFRACTOMETRY; SYNCHROTRONS;

EID: 67649292522     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.011098     Document Type: Article

References (14)

1. L. Deck and P. de Groot, "High-speed noncontact profiler based on scanning white-light interferometry," Appl. Opt. 33, 7334-7338 (1994).
2. L. Lahousse, S. Leleu, J. David, O. Gibaru, S. Ducourtieux, "Z calibration of the LNE ultra precision coordinate measuring machine," in Proceedings of the 9th international conference of the european society for precision engineering and nanotechnology, V 2, 348-353 (2007).
3. J. Cohen-Sabban and D. Reolon, "Vibration insensitive 3D-profilometry: a new type of white light interferometric microscopy" Proc. SPIE 7064, (2008).
4. D. J. Whitehouse, "Some theoretical aspects of error separation techniques in surface metrology," J. Phys. E Sci. Instrum. 9, 531-536 (1976).
5. W. Gao and S. Kiyono, "High accuracy profile measurement of a machined surface by the combined method," Measurement 19, 55-64 (1996).
6. C. Elster, I. Weingaertner, and M. Schulz, "Coupled distance sensor systems for high-accuracy topography measurement: Accounting for scanning stage and systematic sensor errors," Prec. Eng. 30, 32-38 (2006).
7. A. Wiegmann, M. Schulz, and C. Elster, "Absolute profile measurement of large moderately flat optical surfaces with high dynamic range," Opt. Express 16, 11975-11986 (2008), http://www.opticsinfobase.org/oe/ abstract.cfm?URI=oe-16-16-11975.
8. μPhase Interferometer, FISBA Optik AG, CH-9016 St. Gallen and FISBA Optik GmbH, Berlin, http://www.fisba.ch/.
9. MPLS 180, STIL - 595, rue Pierre Berthier - Domaine de Saint Hilaire - 13855 Aix en Provence Cedex 3 - FRANCE, http://www.stilsa.com/.
10. E. Marsh, J. Couey, and R. Vallance, "Nanometer-Level Comparison of Three Spindle Error Motion Separation Techniques," J. Manuf. Sci. Eng. 128, 180-187 (2006)
11. V. Bakshi, EUV Lithography (John Wiley & Sons, 2009), Chap. 5.3
12. B. Doerband and J. Hetzler, "Characterizing lateral resolution of interferometers: the Height Transfer Function (HTF)," Proc. SPIE 5878, 587806 (2005).
13. R. Krueger-Sehm, P. Bakucz, L. Jung, H. Wilhelms, "Chirp- Kalibriernormale fuer Obeflaechenmessgeraete". Technisches Messen 74, 572-576 (2007).
14. A. Wiegmann, C. Elster, M. Schulz, M. Stavridis, "Absolute Topographievermessung gekruemmter optischer Oberflaechen mit hoher lateraler Aufloesung", in Proceedings of the 109th DgaO, http://www.dgao- proceedings.de/download/109/109-p28.pdf.