The structural, magnetic and nanomechanical properties of hexagonal Co thin films

Journal of Alloys and Compounds

Volumn 481, Issue 1-2, 2009, Pages 365-368

  Chen, Yuan Tsung ^a   Jian, S R ^a  

^a I SHOU UNIVERSITY   (Taiwan)

Author keywords

Co thin film; Magnetic annealing; Nanoindentation

Indexed keywords

ANNEALING ENVIRONMENT; CO THIN FILM; CO THIN FILMS; DEVICE PERFORMANCE; GLASS SUBSTRATES; GRAIN DISTRIBUTION; INDUSTRY APPLICATIONS; MAGNETIC ANNEALING; MAGNETIC TUNNEL JUNCTION; MAGNETORESISTANCE RANDOM ACCESS MEMORY; MICROSTRUCTURE PROPERTIES; NANOINDENTATION TESTS; NANOMECHANICAL PROPERTY; PINNED LAYERS; POST ANNEALING; READ HEADS; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; YOUNG'S MODULUS;

ANNEALING; DIFFRACTION; ELECTRIC RESISTANCE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HOLOGRAPHIC INTERFEROMETRY; MAGNETIC DEVICES; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; MAGNETISM; MAGNETORESISTANCE; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOINDENTATION; RANDOM ACCESS STORAGE; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; THIN FILM DEVICES; THIN FILMS; TUNNEL JUNCTIONS; VAPOR DEPOSITION; WAVEGUIDE JUNCTIONS;

COBALT;

EID: 67649291841     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.02.134     Document Type: Article

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