Effect of finite interfacial diffusion on microstructure, magnetic properties and hardness of FePt/B4C multilayer thin films

Journal of Physics D: Applied Physics

Volumn 41, Issue 15, 2008, Pages

  Yang, Fujun ^a   Wang, Hao ^a   Wang, Baoyuan ^a   Wang, Hanbin ^a   Yang, Changping ^a   Zhou, Mingjie ^b   Li, Quan ^b   Chong, Yat Ming ^c   Zhang, Wen Jun ^c   Jiang, Yong ^d  

^a HUBEI UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^d UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACIAL DIFFUSIONS;

MAGNETIC PROPERTIES;

EID: 49749147150     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/15/155310     Document Type: Article

References (24)

1. Weller D, Moser A, Folks L, Best M E, Lee W, Toney M F, Schwickert M, Thiele J U and Doerner M F 2000 IEEE Trans. Magn. 36 10
2. Wang H and Wong S P 2002 Magnetic Nanostructures ed H S Nalwa (Valencia, CA: American Scientific Publishers) p 407
3. Li N and Lairson B M 1999 IEEE Trans. Magn. 35 1077
4. Aoyama T, Sato I, Ito H and Ishio S 2005 J. Magn. Magn. Mater. 287 209
5. Perumal A, Ko H S and Shin S C 2003 Appl. Phys. Lett. 83 3326
6. Chen J S, Ding Y F, Lim B C and Liu E J 2006 IEEE. Trans. Magn. 42 2363
7. Perumal A, Ko H S and Shin S C 2003 Appl. Phys. Lett. 83 3326
8. Luo C P, Liou S H, Gao L, Liu Y and Sellmyer D J 2000 Appl. Phys. Lett. 77 2225
9. Yan M L, Zeng H, Powers N and Sellmyer D J 2002 J. Appl. Phys. 91 8471
10. Kim H J and Lee S R 2005 J. Appl. Phys. 97 10H304
11. White C W, Withrow S P, Williams J M, Budai J D, Meldrum A, Sorge K D, Thompson J R and Boatner L A 2004 J. Appl. Phys. 95 8160
12. Phuoc N N and Suzuki T 2006 J. Appl. Phys. 99 08C107
13. Yan M L, Xu Y F, Li X Z and Sellmyer D J 2005 J. Appl. Phys. 97 10H309
14. Huang J C A, Chang Y C, Yu C C, Yao Y D, Hu Y M and Fu C M 2003 J. Appl. Phys. 93 8173
15. Kang K, Zhang Z G, Papusoi C and Suzuki T 2003 Appl. Phys. Lett. 82 3284
16. Zhou Y Z, Chen J S, Chow G M and Wang J P 2004 J. Appl. Phys. 95 7495
17. Berry D C, Kim J, Barmak K, Wierman K, Svedberg E B and Howard J K 2005 Scr. Mater. 53 423
18. Chen S K, Yuan F T and Chin T S 2005 J. Appl. Phys. 97 073902
19. Yang F J, Wang H, Wang H B, Cao X, Yang C P, Li Q, Zhou M J, Chong Y M and Zhang W J 2007 J. Appl. Phys. 102 106101
20. Yang F J, Wang H, Wang H B, Cao X, Yang C P, Li Q, Zhou M J, Chong Y M and Zhang W J 2007 J. Phys. D: Appl. Phys. 40 6735
21. Shima T, Takanashi K, Takahashi Y K and Hono K 2004 Appl. Phys. Lett. 85 2571
22. Daniels D J, Nix W D and Clemens B M 1995 Appl. Phys. Lett. 66 2969
23. Chu X and Barnett S A 1995 J. Appl. Phys. 77 4403
24. Martínez E, Romero J, Lousa A and Esteve J 2002 J. Phys. D: Appl. Phys. 35 1880