Comparison of on-wafer multiline TRL and LRM+ calibrations for RF CMOS applications

2008 72nd ARFTG Microwave Measurement Symposium, ARFTG 2008

Volumn , Issue , 2008, Pages 132-136

  Rumiantsev, Andrej ^a   Sweeney, Susan L ^b   Corson, Phillip L ^b  

^a SUSS MicroTec Lithography GmbH   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

Calibration comparison; Clibration; CMOS; Deembedding; Error correction; Scattering parameters measurement

Indexed keywords

CLIBRATION; CMOS; CMOS PROCESS; DEEMBEDDING; FREQUENCY RANGES; M-TECHNOLOGIES; ON-WAFER; PARASITICS; QUANTITATIVE COMPARISON; RF-CMOS; SCATTERING PARAMETERS MEASUREMENT;

ERROR CORRECTION; SCATTERING PARAMETERS;

CALIBRATION;

EID: 67649223945     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ARFTG.2008.4804291     Document Type: Conference Paper

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