Synthesis Ti-Si-N nanocomposite coating prepared by a hybrid system of double bending filtered vacuum arc source and magnetron sputtering

Current Applied Physics

Volumn 9, Issue 3 SUPPL., 2009, Pages

  Kim, Do Geun ^a   Svadkovski, Igor ^a,b   Lee, Seunghun ^a   Choi, Jong Won ^a   Kim, Jong Kuk ^a  

^a Korea Institute of Material Science   (South Korea)

^b BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Filtered vacuum arc source; Magnetron sputtering; Ti Si N

Indexed keywords

AMORPHOUS SI; CURRENT INCREASE; FILTERED VACUUM ARC SOURCE; HIGH SPEED STEEL SUBSTRATE; HYBRID COATING SYSTEMS; MAGNETIC SYSTEM; NANO-COMPOSITE COATING; SI CONTENT; SI WAFER; SOLENOID COILS; SPUTTERING TECHNIQUES; SUBSTRATE SURFACE; TI-SI-N; TI-SI-N COATINGS; VACUUM ARCS; VACUUM CHAMBERS;

AMORPHOUS SILICON; CAVITY RESONATORS; COATINGS; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; NANOCOMPOSITES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; TITANIUM COMPOUNDS; TITANIUM NITRIDE; VACUUM; VACUUM DEPOSITION; VACUUM TECHNOLOGY;

SILICON WAFERS;

EID: 67349286028     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.01.027     Document Type: Article

References (16)

1. Martin P.J., and Bendavid A. Thin Solid Films 394 (2001) 1-15
2. Kim K.H., Choi S.-R., and Yoon S.-Y. Surf. Coat. Technol. 298 (2002) 243-248
3. Patscheider J., Zehnder T., and Disserens M. Surf. Coat. Technol. 146-147 (2001) 201-208
4. Veprek S. Surf. Coat. Technol. 97 (1997) 15
5. Diserens M., Patscheider J., and Levy F. Surf. Coat. Technol. 120-121 (1999) 158
6. Kim K.H., and Park B.H. Chem. Vapor Depos. 5 6 (1999) 275
7. Vaz F., Rebouta L., Goudeau P., Pacaud J., Garem H., Riviere J.P., Cavaleiro A., and Alves E. Surf. Coat. Technol. 133-134 (2000) 307
8. Zhang S., Sun D., Fu Y., and Du H. Surf. Coat. Technol. 167 (2003) 113-119
9. Veprek S. J. Vac. Sci. Technol. A 17 5 (1999) 2401
10. Aksenov I.I., Belous V.A., and Padalka V.G. Instrum. Exp. Tech. 21 (1978) 1416-1418
11. D.A. Baldwin, S. Fallabella, Deposition processes utilizing a new filtered cathodic arc source, in: Proc. of the 38th Annual Techn. Conf., Soc. of Vacuum Coaters, Chicago, April 2-7, 1995, pp. 309-316.
12. Aksenov I.I., Belous V.A., Vasilev V.V., Volkov Y.Y., and Strelnitskij V.E. Diam. Relat. Mater. 8 (1999) 468-471
13. Shizhi L., Yulong S., and Hongrui P. Plasma Chem. Plasma Process. 12 3 (1992) 287
14. He J.L., Chen C.K., and Hon M.H. Wear 181-183 (1995) 189
15. Kim S.H., Kim J.K., and Kim K.H. Thin Solid Films 420-421 (2002) 360
16. Choi J.B., Cho K., Lee M.-H., and Kim K.H. Thin Solid Films 447-448 (2004) 365-370