Dendritic growth of amorphous gallium oxide in mixed GaOx/WOx thin films

Materials Chemistry and Physics

Volumn 116, Issue 1, 2009, Pages 175-182

  Penner, Simon ^a   Stöger Pollach, Michael ^b,c   Klauser, Frederik ^a   Lorenz, Harald ^a   Klötzer, Bernhard ^a   Liu, Xianjie ^a   Jenewein, Bernd ^a   Bertel, Erminald ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b University Service Centre for Transmission Electron Microscopy   (Austria)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Amorphous materials; Electron microscopy; Physical vapour deposition; Thin films

Indexed keywords

ATOMIC-FORCE MICROSCOPIES; CO DEPOSITIONS; CO-DEPOSITED FILMS; CONTACT AREAS; DENDRITIC GROWTHS; FILM MORPHOLOGIES; GALLIUM OXIDES; HIGH RESOLUTIONS; INTRINSIC FEATURES; NACL SUBSTRATES; OXIDE DEPOSITIONS; PECULIAR MORPHOLOGIES; PHYSICAL VAPOUR DEPOSITION; PREPARATION CONDITIONS; SELECTED-AREA ELECTRON DIFFRACTIONS; SMALL DIAMETERS; STRUCTURE AND MORPHOLOGIES; TEM; THIN FILM SYSTEMS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

AMORPHOUS FILMS; ATOMIC SPECTROSCOPY; DENDRIMERS; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRONS; GALLIUM; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY; OXYGEN; SODIUM CHLORIDE; THERMAL EVAPORATION; THIN FILMS; THREE DIMENSIONAL; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM PREPARATION;

EID: 67349249153     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.03.013     Document Type: Article

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