SCOPUS 정보 검색 플랫폼

Volumn 86, Issue 7-9, 2009, Pages 1777-1779

Effect of heat treatments on electric dipole at metal/high-k dielectric interfaces measured by in situ XPS

Author keywords

Effective work function; High k dielectric; Metal gate; XPS

Indexed keywords

EFFECTIVE WORK FUNCTION; ELECTRIC DIPOLE; HIGH-K DIELECTRIC; IN-SITU; K DIELECTRICS; METAL GATE; METAL OXIDE SEMICONDUCTOR; XPS;

DIELECTRIC MATERIALS; HAFNIUM COMPOUNDS; HEAT TREATMENT; MOSFET DEVICES; OXYGEN; OXYGEN VACANCIES; WORK FUNCTION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349166973 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.03.028 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.