High-voltage glow discharge plasma immersion ion implantation assisted by magnetic field

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2751-2754

  Tian, Xiubo ^a,b   Gong, Chunzhi ^a,c   Liu, Lei ^a   Yang, Shiqin ^a,b   Fu, Ricky K Y ^c   Chu, Paul K ^c  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b Shenzhen Key Laboratory of Composite Materials   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

High voltage glow discharge; Magnetic field; Plasma immersion ion implantation

Indexed keywords

DELAY-TIME; EFFECTIVE TOOLS; GAS PRESSURES; GLOW DISCHARGE PLASMAS; HIGH-VOLTAGE GLOW DISCHARGE; IMPLANTATION ENERGIES; IMPLANTED SAMPLES; LOWER PRESSURES; MATERIAL PROPERTIES; PARTICLE COLLISIONS; PLASMA GENERATIONS; PLASMA IMMERSION ION IMPLANTATION; WATER CONTACT ANGLES;

CONTACT ANGLE; ION BOMBARDMENT; ION IMPLANTATION; MAGNETIC FIELDS; MAGNETS; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMAS; POLYETHYLENE TEREPHTHALATES; SURFACE PROPERTIES; THERMOPLASTICS; WATER TREATMENT;

GLOW DISCHARGES;

EID: 67349110418     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.124     Document Type: Article

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