Fabrication of Microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique

Applied Optics

Volumn 48, Issue 13, 2009, Pages 2473-2479

  Wu, Cheng Yi ^a   Chiang, Ting Hsuan ^a   Lai, Ngoc Diep ^a,b   Do, Danh Bich ^a,c   Hsu, Chia Chen ^a,d  

^a NATIONAL CHUNG CHENG UNIVERSITY   (Taiwan)

^b OPTO+   (France)

^c HANOI NATIONAL UNIVERSITY OF EDUCATION   (Viet Nam)

^d NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; LASER BEAM EFFECTS; LASER BEAMS; MICROLENSES; MICROOPTICS; OPTICAL INSTRUMENT LENSES;

ELLIPTICAL SHAPES; FABRICATION PROCESS; HEXAGONAL LATTICE; MICRO-LENS ARRAYS; PATTERN TRANSFERRING; SURFACE PROFILES; TRANSPORT EFFECTS; TWO-BEAM INTERFERENCE;

PHOTORESISTS;

EPOXIDE; POLYMER; SU 8 COMPOUND; SU-8 COMPOUND;

ARTICLE; CHEMISTRY; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; INTERFEROMETRY; LIGHT; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; REFRACTOMETRY;

EPOXY COMPOUNDS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; LENSES; LIGHT; MINIATURIZATION; POLYMERS; REFRACTOMETRY; SCATTERING, RADIATION;

EID: 67249110454     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.002473     Document Type: Article

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