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Journal of Applied Physics

Volumn 105, Issue 9, 2009, Pages

Highly selective electroplated nickel mask for lithium niobate dry etching

(5) Benchabane, Sarah a Robert, Laurent a Rauch, Jean Yves a Khelif, Abdelkrim a Laude, Vincent a

a UNIVERSITÉ DE FRANCHE COMTÉ (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP HOLES; DEEP STRUCTURE; ELECTROPLATED NICKEL; ETCHED PATTERNS; LITHIUM NIOBATE; METAL MASKS; OPERATING PRESSURE; PHONONIC CRYSTAL; PROCESS PARAMETERS; REACTIVE ION; RF-POWER; SIDEWALL ANGLES; SLOPE ANGLES;

ASPECT RATIO; DRY ETCHING; LITHIUM; NICKEL ALLOYS; NICKEL PLATING; NIOBIUM COMPOUNDS; PLASMA ETCHING; SULFUR; SULFUR HEXAFLUORIDE;

REACTIVE ION ETCHING;

EID: 67249104551 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3125315 Document Type: Article

Times cited : (46)

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