Ridge structure etching of LiNbO3 crystal for optical waveguide applications

Optical Materials

Volumn 28, Issue 3, 2006, Pages 216-220

  Park, W J ^a   Yang, W S ^a,b   Kim, W K ^b   Lee, H Y ^b   Lim, J W ^c   Isshiki, M ^c   Yoon, D H ^a  

^a Sungkyunkwan University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

C 3F8 gas flow ratio; LiNbO3; Neutral loop plasma etching; Optical waveguide

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS;

NEUTRAL LOOP PLASMA ETCHING; PLASMA DRY ETCHING;

LITHIUM NIOBATE;

EID: 26944474782     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.07.023     Document Type: Article

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