Fabrication of high-aspect-ratio submicron-to-nanometer range microstructures in LiNbO3 for the next generation of integrated optoelectronic devices by focused ion beams (FIB)

Microwave and Optical Technology Letters

Volumn 22, Issue 6, 1999, Pages 396-398

  Yin, Shizhuo ^a  

^a The Center for Nanotechnology Education and Utilization   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOPTICAL DEVICES; ETCHING; INTEGRATED OPTICS; ION BEAMS; LIGHT MODULATORS; LITHIUM NIOBATE; MICROSENSORS; MICROSTRUCTURE; NANOTECHNOLOGY; OPTICAL SENSORS;

FOCUSED ION BEAM (FIB) ETCHING;

INTEGRATED OPTOELECTRONICS;

EID: 0032652610     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1098-2760(19990920)22:6<396::AID-MOP9>3.0.CO;2-K     Document Type: Article

References (8)

1. A.M. Prokhorov and Y.S. Kuzminov, Physics and chemistry of crystalline lithium niobate, Bristol, New York, 1990.
2. M. Gottlieb, Electro-optic and acousto-optic scanning and deflection. John Martin Ley, New York, 1983.
3. H. Nishihara, M. Haruna, and T. Suhara, Optical integrated circuits, McGraw-Hill, New York, 1989, p. 194.
4. D. Naghski, J. Boyd, H. Jackson, and A. Steckl, Potential for size reduction of AlGaAs optical channel waveguide structures fabricated by focused ion beam implantation and oxidation. Opt Commun 150 (1998), 97-100.
5. 3 by ultra-short UV laser pulses, Appl Phys A 65 (1997), 517-518.
6. 3 phase gratings prepared by a single excimer pulse through a silica phase mask, Appl Phys Lett 69 (1996), 1352-1354.
7. J. Melngailis, Focused ion beam technology and applications, J Vac Sci Technol B5 (1987), 469-495.
8. R. Young, J. Cleaver, and H. Ahmed, Characteristics of gas-assisted focused ion beam etching, J Vac Sci Technol B11 (1993), 234-241.