Fabrication of band-gap structures in planar nonlinear waveguides for second harmonic generation

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 742-748

  Foglietti, V ^a   Cianci, E ^a   Pezzetta, D ^b   Sibilia, C ^b   Marangoni, M ^c   Osellame, R ^c   Ramponi, R ^c  

^a IFN CNR   (Italy)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c INFM   (Italy)

Author keywords

E beam lithography; Nonlinear optics

Indexed keywords

BAND STRUCTURE; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; LITHIUM NIOBATE; NONLINEAR OPTICS; PHOTONS; REACTIVE ION ETCHING; SECOND HARMONIC GENERATION;

PROTON EXCHANGE;

OPTICAL WAVEGUIDES;

EID: 0037682188     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00176-X     Document Type: Conference Paper

References (5)

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3. Pezzetta D., Sibilia C., Bertolotti M., Ramponi R., Osellame R., Marangoni M., Haus J.W., Scalora M., Bloemer M.J., Bowden C.M. Opt. Soc. Am. B. 19:2002;2102-2110.
4. Chen S., Balsi P., DeMicheli M., Ostrowsky D.B., Leycuras A., Tartarini G., Bassi P. IEEE J. Lightwave Technol. 12:1994;862-871.
5. Li M.J., De Micheli M.P., Ostrowsky D.B., Papuchon M. Opt. Commun. 62:1996;17.