EUVL mask dual pods to be used for mask shipping and handling in exposure tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Gomei, Yoshio ^a   Ota, Kazuya ^b   Lystad, John ^c   Halbmair, David ^c   He, Long ^d  

^a CANON INC   (Japan)

^b NIKON CORPORATION   (Japan)

^c ENTEGRIS INC   (United States)

^d SEMATECH   (United States)

Author keywords

Carrier; EUV lithography; Handling; Mask; Shipping

Indexed keywords

VACUUM CYCLING;

ENVIRONMENTAL IMPACT; MASKS; OPTICAL DESIGN; VACUUM APPLICATIONS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148827369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711296     Document Type: Conference Paper

References (6)

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2. st Int. EUV Lithography Symposium, Dallas, 2002 (distributed by CDROM from International SEMATECH).
3. S. Yoshitake, K. Ooki, Y. Ogawa, K. Ogura, T. Yamamoto, R. Hirano, M. Toriumi, T. Tojo, SPIE Vol. 3748 (1999) 436.
4. W. Hinds, "Aerosol Technology", John Wiley & Sons, Inc. (1999) P. 141.
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6. T. Miyajima, M. Baumeister, H. Horibe, presented in SEMATECH EUV Mask Technology «Sc Standards Workshop, Barcelona, 2006 (at https://www.sematech.org/7853 with restricted access).