Selete EUV reticle shipping and storage test results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Ota, Kazuya ^a   Amemiya, Mitsuaki ^a   Taguchi, Takao ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Dual pod; EUVL; Mask carrier; Mask handling; Particle; Reticle pod; Shipping test; Storage test

Indexed keywords

COMPUTER NETWORKS; LITHOGRAPHY; MICROFLUIDICS; STORAGE (MATERIALS); TECHNOLOGY; ULTRAVIOLET DEVICES;

(OTDR) TECHNOLOGY; MASK TECHNOLOGY; NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; RETICLE HANDLING; TEST RESULTS;

OPTICAL INSTRUMENTS;

EID: 45549106357     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793025     Document Type: Conference Paper

References (11)

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