Particle-free mask handling techniques and a dual-pod carrier

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Amemiya, Mitsuaki ^a   Ota, Kazuya ^a   Taguchi, Takao ^a   Kamono, Takashi ^a   Usui, Youichi ^a   Takikawa, Tadahiko ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Dual pod; Euv lithography; Euvl; Mask handling; Particle free; Vacuum transfer

Indexed keywords

CRITICAL ISSUES; DUAL POD; ELECTROSTATIC CHUCKS; ENGINEERING TOOLS; HANDLING TECHNIQUE; IN-VACUUM; MASK BLANK; PARTICLE-FREE; TEST RESULTS; TRANSFER TECHNIQUE; VACUUM TRANSFER; WHOLE PROCESS;

CHUCKS; EXTREME ULTRAVIOLET LITHOGRAPHY; VACUUM;

EXPERIMENTS;

EID: 57249085095     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771569     Document Type: Conference Paper

References (9)

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