Status of EUV reticle handling solution in meeting 32 nm HP EUV lithograrphy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  He, Long ^a   Wurm, Stefan ^a   Seidel, Phil ^a   Orvek, Kevin ^a   Betancourt, Ernie ^a   Underwood, Jon ^a  

^a SEMATECH   (United States)

Author keywords

EUV mask; EUV reticle; EUV reticle protection; EUV reticle handling; EUVL manufactureability; Extreme ultraviolet lithography (EUVL)

Indexed keywords

EUV MASK; EUV RETICLE; EUV RETICLE PROTECTION; EUV RETICLE-HANDLING; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

EXTREME ULTRAVIOLET LITHOGRAPHY; INDUSTRY; MASKS;

OPTICAL INSTRUMENTS;

EID: 57249085094     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773278     Document Type: Conference Paper

References (14)

1. International Extreme Ultra-Violet Lithography (EUVL) Symposia, 2002-2007. The symposium materials can be found at http://www.sematech.org/ meetings/archives.htm.
2. SEMATECH EUVL Reticle-handling Work Shop, San Jose, CA, 28 Feb. 2005. The workshop proceedings can be found at http://www.sematech.org/meetings/archives. htm.
3. P. Yan, et al., Clean Mask Shipping Module Development and Demonstration for EUVL Masks and Blanks, Photomask Japan, 2006.
4. SEMI Draft Document 4466 - New standard: Mechanical specification for a 150mm EUVL reticle SMIF pod (EUVpod). The document can be obtained from SEMI, or at http://downloads.semi.org/pubs/wstdsbal.nsf/TBPIC?OpenForm.
5. He, et al, "Status and path to a final EUVL reticle-handling solution", SPIE 6517 (2007) 65171O.
6. K. Ota et al., EUV Reticle Carrier: Joint Proposal and Current Status of Canon and Nikon, in ref [1] (2006).
7. D. Halbmaier, et al., EUVL mask carrier system, in ref [1] (2006).
8. Gomei, et al., "EUVL mask dual pods to be used for mask shipping and handling in exposure tools", SPIE 6517 (2007) 65170W.
9. B. Blum, ASML frame and storage reticle handling approach, in ref [2] (2005).
10. K. Orvek, et al., Concept Demonstration of Integrated Particle Defect Control of EUVL Masks, in ref [1] (2005).
11. L. He et al. Progress and Challenge in Achieving Defect-Free EUV Reticle Handling, in ref [1] (2007).
12. L. He, et. al., Status and Path to Particle-Free EUV Reticle Protection and Handling, in ref [1] (2006).
13. K. Tsai, et at., On the Sensitivity Improvement and Cross-correlation Methodology for Confocal EUV Mask Blank Defect Inspection Tool Fleet, BACUS Photomask Technology Conference, 2005.
14. P. Kearney et al., Defect Mitigation and Reduction in EUVL Mask Blanks, in ref [1] (2006).