Status and path to a final EUVL reticle-handling solution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  He, Long ^a   Orvek, Kevin ^a   Seidel, Phil ^a   Wurm, Stefan ^a   Underwood, Jon ^a   Betancourt, Ernie ^a  

^a SEMATECH   (United States)

Author keywords

EUV mask; EUV reticle; EUV reticle protection; EUV reticle handling; Extreme ultraviolet lithography (EUVL)

Indexed keywords

PELLICLES CALLS; RETICLE PROTECTION;

MASKS; ROBOTICS; SENSITIVITY ANALYSIS; VACUUM;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148817453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712872     Document Type: Conference Paper

References (11)

1. International Extreme Ultra-Violet Lithography (EUVL) Symposia, 2002-2006. The symposium materials can be found at http://www.sematech.org/ meetings/arc.hives.htm.
2. SEMATECH EUVL Reticle-handling Work Shop, San Jose, CA, 28 Feb. 2005. The workshop proceedings can be found at http://www.sematech.orp/meetings/arc. hives.htm.
3. P. Yan, et al., Clean Mask Shipping Module Development and Demonstration for EUVL Masks and Blanks, Photomask Japan, 2006
4. TDK presentation at SEMATECH Reticle Handling Workshop, Barcelona, Spain, October, 2006. The workshop proceedings can be found at http://www.sematech. org/meetings/archives.htm.
5. B. Blum, ASML frame and storage reticle handling approach, in ref [2] (2005).
6. K. Orvek, et al., Concept Demonstration of Integrated Particle Defect Control of EUVL Masks, in ref [1] (2005).
7. K. Ota et al., EUV Reticle Carrier: Joint Proposal and Current Status of Canon and Nikon, in ref [1] (2006).
8. D. Halbmaier, et al., EUVL mask carrier system, in ref [1] (2006).
9. K. Tsai, et al., On the Sensitivity Improvement and Cross-correlation Methodology for Confocal EUV Mask Blank Defect Inspection Tool Fleet, BACUS Photomask Technology Conference, 2005.
10. L. He, et. al., Status and Path to Particle-Free EUV Reticle Protection and Handling, in ref [1] (2006).
11. P. Kearney et al., Defect Mitigation and Reduction in EUVL Mask Blanks, in ref [1] (2006)