The structural characterisation of HWCVD-deposited nanocrystalline silicon films

South African Journal of Science

Volumn 105, Issue 1-2, 2009, Pages 77-80

  Swain, Bibhu P ^a,b  

^a UNIVERSITY OF CAPE TOWN   (South Africa)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

HWCVD; Raman; SAXS; XRD

Indexed keywords

CONCENTRATION (COMPOSITION); CRYSTAL STRUCTURE; HYDROGEN; NANOTECHNOLOGY; RAMAN SPECTROSCOPY; SILICON; X-RAY DIFFRACTION;

EID: 67149126739     PISSN: 00382353     EISSN: None     Source Type: Journal    
DOI: 10.1590/S0038-23532009000100025     Document Type: Article

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