The effect of hydrogen dilution on the micro structure and stability of a-Si:H films prepared by different techniques

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 34-38

  Bauer, S ^a   Schroder B ^a   Oechsner, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

a Si:H; Hydrogen; Plasma enhanced chemical vapour deposition

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; FILM PREPARATION; HYDROGEN BONDS; HYDROGENATION; MICROSTRUCTURE; PLASMA APPLICATIONS; SURFACE ROUGHNESS;

DILUTION; HOT WIRE DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS SILICON;

EID: 0032068766     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00164-1     Document Type: Article

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