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Volumn 66, Issue 1-4, 2001, Pages 413-419
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More stable low gap a-Si:H layers deposited by PE-CVD at moderately high temperature with hydrogen dilution
a
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
HIGH TEMPERATURE EFFECTS;
PHOTOCHEMICAL REACTIONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON SOLAR CELLS;
HYDROGEN DILUTION;
PLASMA EXCITATION FREQUENCY;
AMORPHOUS SILICON;
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EID: 0035254712
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(00)00202-6 Document Type: Article |
Times cited : (14)
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References (10)
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