Microstructural evolution of a-Si:H prepared using hydrogen dilution of silane studied by real time spectroellipsometry

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 73-77

  Koh, Joohyun ^a   Fujiwara, H ^a   Collins, R W ^a   Lee, Yeeheng ^b   Wronski, C R ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b The Pennsylvania State University   (United States)

Author keywords

a Si:H; Microstructure; Silane dilution; Spectroellipsometry

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; FILM PREPARATION; HYDROGENATION; MICROSTRUCTURE; NUCLEATION; OPTICAL PROPERTIES; PLASMA APPLICATIONS; SILANES; SURFACE ROUGHNESS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SPECTROELLIPSOMETRY;

AMORPHOUS SILICON;

EID: 4243436150     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00023-4     Document Type: Article

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