Methodology of flare modeling and compensation in EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Kim, Insung ^a   Kang, Hoyoung ^b   Park, Changmin ^a   Park, Joo On ^a   Lee, Jeonghoon ^a   Park, Jinhong ^a   Goo, Doohoon ^a   Yeo, Jeongho ^a   Choi, Seong Woon ^a   Han, Woosung ^a  

^a SAMSUNG Electronics   (South Korea)

^b ASML   (Netherlands)

Author keywords

ADT; CD; EUV; Flare; OPC; PSF

Indexed keywords

ADT; CD; EUV; FLARE; OPC; PSF;

APPROXIMATION THEORY; CONVOLUTION; DATA STORAGE EQUIPMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; FRACTALS; LEARNING ALGORITHMS; MIRRORS; PHOTORESISTS; SIGNAL FILTERING AND PREDICTION; SURFACE ROUGHNESS; ULTRAVIOLET DEVICES;

OPTICAL TRANSFER FUNCTION;

EID: 62449096994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804673     Document Type: Conference Paper

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