Full field EUV lithography: Lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Hendrickx, E ^a   Goethals, A M ^a   Niroomand, A ^b   Jonckheere, R ^a   Van Roey, F ^a   Lorusso, G F ^a   Hermans, J ^a   Baudemprez, B ^a   Ronse, K ^a  

^a IMEC   (Belgium)

^b Micron ^*

Author keywords

EUV alpha demo tool; EUV imaging; EUV lithography; EUV resist; EUV reticle defectivity

Indexed keywords

EUV ALPHA DEMO TOOL; EUV IMAGING; EUV LITHOGRAPHY; EUV RESIST; EUV RETICLE DEFECTIVITY;

DEFECTS; DIES; MASKS; OPTICAL INSTRUMENTS; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 62449213625     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.805408     Document Type: Conference Paper

References (7)

1. H. Meiling et al, "Performance of the Full Field EUV Systems", Proc. SPIE 6921 (2008)
2. G. F. Lorusso et al, "Imaging performance of the EUV alpha demo tool at IMEC", Proc. SPIE 6921 (2008)
3. Roel Gronheid, Harun H. Solak, Yasin Ekinci, Amandine Jouve, and Frieda Van Roey, Microelectronic Engineering 83 (2006), 1103-1106
4. th International Symposium on Extreme Ultraviolet Lithography, September 29-October 1, Lake Tahoe, USA (2008)
5. R. Jonckheere et al, "Mask defect printability in Full Field EUV Lithography", Presented at the 2007 International Symposium on Extreme Ultraviolet Lithography, Sapporo, Japan (2007)
6. R. Jonckheere et at, "Investigation of mask defectivity in full field EUV lithography", Proc. SPIE 6730 (2007)
7. th international 2008 International Symposium on Extreme Ultraviolet Lithography, September 29-October 1, Lake Tahoe, USA (2008)