Interface morphologies and interlayer diffusions in organic light emitting device by x-ray scattering

Applied Physics Letters

Volumn 94, Issue 22, 2009, Pages

  Lee, Young Joo ^a   Park, Seong Sik ^b   Kim, Jinwoo ^c   Kim, Hyunjung ^a  

^a Sogang University   (South Korea)

^b Samsung Corning Co Ltd   (South Korea)

^c Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

8-HYDROXYQUINOLINE; COPPER PHTHALOCYANINE; HIGHER TEMPERATURES; INTERFACE MORPHOLOGIES; INTERFACE SHARPNESS; INTERLAYER DIFFUSION; ORGANIC LIGHT-EMITTING DEVICES; QUASI-SATURATION; ROUGHNESS CORRELATION; SURFACE AND INTERFACES; SYNCHROTRON X-RAY SCATTERING;

ALUMINA; GLASS; GLASS TRANSITION; LIGHT EMISSION; MORPHOLOGY; SCATTERING; THERMAL EXPANSION; THERMAL STRESS; TIN; X RAY SCATTERING;

DIFFUSION;

EID: 66749098868     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3148648     Document Type: Article

References (20)

1. C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett. 0003-6951 51, 913 (1987). 10.1063/1.98799
2. Y. Kuwabara, H. Ogawa, H. Inada, N. Noma, and Y. Shirota, Adv. Mater. (Weinheim, Ger.) 0935-9648 6, 677 (1994). 10.1002/adma.19940060913
3. C. Adachi, K. Nagai, and N. Tamoto, Appl. Phys. Lett. 0003-6951 66, 2679 (1995). 10.1063/1.113123
4. S. Tokito, H. Tanaka, K. Noda, A. Okada, and Y. Taga, Appl. Phys. Lett. 0003-6951 70, 1929 (1997). 10.1063/1.118782
5. D. F. O'Brien, P. E. Burrows, S. R. Forrest, B. E. Koene, D. E. Loy, and M. E. Thompson, Adv. Mater. (Weinheim, Ger.) 0935-9648 10, 1108 (1998). 10.1002/(SICI)1521-4095(199810)10:14<1108::AID-ADMA1108>3.0.CO;2-S
6. X. Zhou, J. He, L. S. Liao, M. Lu, X. M. Ding, X. Y. Hou, X. M. Zhang, X. Q. He, and S. T. Lee, Adv. Mater. (Weinheim, Ger.) 0935-9648 12, 265 (2000). 10.1002/(SICI)1521-4095(200002)12:4<265::AID-ADMA265>3.0.CO;2-L
7. Y. J. Lee, H. Lee, Y. Byun, S. Song, J. Kim, D. Eom, W. Cha, S. Park, J. Kim, and H. Kim, Thin Solid Films 0040-6090 515, 5674 (2007). 10.1016/j.tsf.2006.12.018
8. E. Han, L. Do, Y. Niidome, and M. Fujihira, Chem. Lett. 0366-7022 23, 969 (1994). 10.1246/cl.1994.969
9. P. Fenter, F. Schreiber, V. Bulović, and S. R. Forrest, Chem. Phys. Lett. 0009-2614 277, 521 (1997). 10.1016/S0009-2614(97)00941-X
10. K. Orita, T. Morimura, T. Horiuchi, and K. Matsushige, Synth. Met. 0379-6779 91, 155 (1997). 10.1016/S0379-6779(98)80078-7
11. E. Han, L. Do, N. Yamamoto, and M. Fujihira, Chem. Lett. 0366-7022 24, 57 (1995). 10.1246/cl.1995.57
12. M. S. Xu and J. B. Xu, J. Phys. D: Appl. Phys. 0022-3727 37, 1603 (2004). 10.1088/0022-3727/37/12/002
13. M. C. Sun, J. H. Jou, W. K. Weng, and Y. S. Huang, Thin Solid Films 0040-6090 491, 260 (2005). 10.1016/j.tsf.2005.05.036
14. L. G. Parratt, Phys. Rev. 95, 359 (1954). 10.1103/PhysRev.95.359
15. M. Tolan, X-ray Scattering from Soft-Matter Thin Films, Springer Tracts in Modern Physics, Vol. 148 (Springer, Berlin, 1999), pp. 16-17.
16. D. R. Lee, K. Shin, O. H. Seeck, H. Kim, Y. -S. Seo, M. Tolan, and M. H. Rafailovich, Phys. Rev. Lett. 0031-9007 90, 185503 (2003). 10.1103/PhysRevLett. 90.185503
17. O. H. Seeck, I. D. Kaendler, M. Tolan, K. Shin, M. H. Rafailovich, J. Sokolov, and R. Kolb, Appl. Phys. Lett. 0003-6951 76, 2713 (2000). 10.1063/1.126452
18. S. Caria, E. Da Como, M. Murgia, R. Zamboni, P. Melpignano, and V. Biondo, J. Phys.: Condens. Matter 0953-8984 18, S2139 (2006). 10.1088/0953-8984/18/33/S29
19. Y. J. Lee, X. Li, D. Kang, S. Park, J. Kim, J. Choi, and H. Kim, Ultramicroscopy 0304-3991 108, 1315 (2008). 10.1016/j.ultramic.2008.04.086
20. M. Colle, J. Gmeiner, W. Milius, H. Hillebrecht, and W. Brutting, Adv. Funct. Mater. 1616-301X 13, 108 (2003). 10.1002/adfm.200390015