Crystallization dynamics of nitrogen-doped Ge2Sb 2Te5

Journal of Applied Physics

Volumn 105, Issue 10, 2009, Pages

  Shelby, Robert M ^a   Raoux, Simone ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL NUCLEI; CRYSTALLIZATION DYNAMICS; CRYSTALLIZATION TIME; DEPOSITED FILMS; NITROGEN CONCENTRATIONS; NITROGEN-DOPED; PULSED LASER HEATING;

CRYSTALLIZATION; DOPING (ADDITIVES); GERMANIUM; LASER HEATING; NITROGEN; PULSED LASER APPLICATIONS; TELLURIUM COMPOUNDS;

AMORPHOUS FILMS;

EID: 66549108973     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3126501     Document Type: Article

References (24)

1. J. H. Coombs, A. P. J. M. Jongenelis, W. Vanesspiekman, and B. A. J. Jacobs, J. Appl. Phys. 0021-8979 78, 4906 (1995). 10.1063/1.359779
2. J. H. Coombs, A. P. J. M. Jongenelis, W. Vanesspiekman, and B. A. J. Jacobs, J. Appl. Phys. 0021-8979 78, 4918 (1995). 10.1063/1.359780
3. C. B. Peng, L. Cheng, and M. Mansuripur, J. Appl. Phys. 0021-8979 82, 4183 (1997). 10.1063/1.366220
4. J. Park, M. R. Kim, W. S. Choi, H. Seo, and C. Yeon, Jpn. J. Appl. Phys., Part 1 0021-4922 38, 4775 (1999). 10.1143/JJAP.38.4775
5. V. Weidenhof, I. Friedrich, S. Ziegler, and M. Wuttig, J. Appl. Phys. 0021-8979 86, 5879 (1999). 10.1063/1.371606
6. V. Weidenhof, I. Friedrich, S. Ziegler, and M. Wuttig, J. Appl. Phys. 0021-8979 89, 3168 (2001). 10.1063/1.1351868
7. S. Privitera, C. Bongiorno, E. Rimini, and R. Zonca, Appl. Phys. Lett. 0003-6951 84, 4448 (2004). 10.1063/1.1759063
8. K. Wang, C. Steimer, D. Wamwangi, S. Ziegler, M. Wuttig, J. Tomforde, and W. Bensch, Microsyst. Technol. 0946-7076 13, 203 (2007). 10.1007/s00542-006- 0156-5
9. H. Seo, T. H. Jeong, J. W. Park, C. Yeon, S. J. Kim, and S. Y. Kim, Jpn. J. Appl. Phys., Part 1 0021-4922 39, 745 (2000). 10.1143/JJAP.39.745
10. T. H. Jeong, M. R. Kim, H. Seo, J. W. Park, and C. Yeon, Jpn. J. Appl. Phys., Part 1 0021-4922 39, 2775 (2000). 10.1143/JJAP.39.2775
11. S. Privitera, E. Rimini, and R. Zonca, Appl. Phys. Lett. 0003-6951 85, 3044 (2004). 10.1063/1.1805200
12. S. M. Kim, M. J. Shin, D. J. Choi, K. N. Lee, S. K. Hong, and Y. J. Park, Thin Solid Films 0040-6090 469-470, 322 (2004). 10.1016/j.tsf.2004.08.142
13. Y. F. Lai, B. W. Qiao, J. Feng, Y. Le, L. Z. La, Y. Y. Lin, T. A. Tang, B. C. Cai, and B. M. Chen, J. Electron. Mater. 0361-5235 34, 176 (2005). 10.1007/s11664-005-0230-2
14. D. Dimitrov and H. P. D. Shieh, Mater. Sci. Eng., B 0921-5107 107, 107 (2004). 10.1016/j.mseb.2003.10.110
15. M. J. Shin, S. M. Kim, D. J. Choi, K. N. Lee, S. K. Hong, and Y. J. Park, J. Mater. Sci. 0022-2461 40, 1543 (2005). 10.1007/s10853-005-0600-4
16. S. Senkader and C. D. Wright, J. Appl. Phys. 0021-8979 95, 504 (2004). 10.1063/1.1633984
17. K. F. Kelton, J. Non-Cryst. Solids 0022-3093 163, 283 (1993). 10.1016/0022-3093(93)91306-N
18. G. F. Zhou, Mater. Sci. Eng., A 0921-5093 304-306, 73 (2001). 10.1016/S0921-5093(00)01448-9
19. G. F. Zhou and B. A. J. Jacobs, Jpn. J. Appl. Phys., Part 1 0021-4922 38, 1625 (1999). 10.1143/JJAP.38.1625
20. S. Raoux, C. T. Rettner, J. L. Jordan-Sweet, V. R. Deline, J. B. Philipp, and H. -L. Lung, Proceedings of the European Phase-Change and Ovonic Science Symposium 2006 (European Phase Change and Ovonics Symposium, Grenoble, France, 2006).
21. H. C. F. Martens, R. Vlutters, and J. C. Prangsma, J. Appl. Phys. 0021-8979 95, 3977 (2004). 10.1063/1.1667606
22. P. K. Khulbe, E. M. Wright, and M. Mansuripur, J. Appl. Phys. 0021-8979 88, 3926 (2000). 10.1063/1.1289811
23. G. Ruitenberg, A. K. Petford-Long, and R. C. Doole, J. Appl. Phys. 0021-8979 92, 3116 (2002). 10.1063/1.1503166
24. J. S. Wei and F. X. Gan, Thin Solid Films 0040-6090 441, 292 (2003). 10.1016/S0040-6090(03)00977-5