Thickness dependent crystallization speed in thin phase change layers used for optical recording

Journal of Applied Physics

Volumn 95, Issue 8, 2004, Pages 3977-3983

  Martens, H C F ^a   Vlutters, R ^a   Prangsma, J C ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANTIMONY ALLOYS; APPROXIMATION THEORY; COOLING; CRYSTAL GROWTH; CRYSTALLIZATION; GIBBS FREE ENERGY; LIGHT POLARIZATION; NANOSTRUCTURED MATERIALS; NUCLEAR BATTERIES; OPTICAL BEAM SPLITTERS; PARAMETER ESTIMATION; POLYCRYSTALLINE MATERIALS; REACTION KINETICS;

CRYSTALLIZATION SPEED; LAYER THICKNESS; NUMERICAL APERTURE (NA); PHASE CHANGE LAYERS;

OPTICAL RECORDING;

EID: 2342505727     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1667606     Document Type: Article

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