Characterization of metal oxide nanofilm morphologies and composition by terahertz transmission spectroscopy

Optics Letters

Volumn 34, Issue 9, 2009, Pages 1360-1362

  Heilweil, Edwin J ^a   Maslar, James E ^a   Kimes, William A ^a   Bassim, Nabil D ^a,b   Schenck, Peter K ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; HAFNIUM OXIDES; METALLIC COMPOUNDS; METALS; NONDESTRUCTIVE EXAMINATION; TERAHERTZ SPECTROSCOPY; THIN FILMS;

ATOMIC LAYER DEPOSITED; DEPOSITION CONDITIONS; METAL OXIDE THIN FILMS; NOMINAL THICKNESS; NONDESTRUCTIVE CHARACTERIZATION; SILICON SUBSTRATES; TERAHERTZ ABSORPTION; TERAHERTZ TRANSMISSION;

OXIDE FILMS;

EID: 66349128845     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.34.001360     Document Type: Article

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