Structural evolution during growth of electrodeposited Co-Cu/Cu multilayers with giant magnetoresistance

Thin Solid Films

Volumn 424, Issue 2, 2003, Pages 229-238

  Cziráki, Á ^a   Peter L ^b   Arnold, B ^c   Thomas, J ^c   Bauer, H D ^c   Wetzig, K ^c   Bakonyi, I ^b  

^a EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^c IFW DRESDEN   (Germany)

Author keywords

Giant magnetoresistance; Multilayers; Structural properties; Transmission electron microscopy

Indexed keywords

CRYSTAL STRUCTURE; ELECTRODEPOSITION; MICROSTRUCTURE; MULTILAYERS; STRESS ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

STRUCTURAL EVOLUTION;

GIANT MAGNETORESISTANCE;

EID: 0142069922     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01126-4     Document Type: Article

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