Detection in the ppm range and high-resolution depth profiling with the new SNMS instrument INA-X

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 5, 2004, Pages 655-658

  Jorzick, J ^a   Losch J ^a   Kopnarski, M ^a   Oechsner, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON GAS; INERT GASES; INSULATING MATERIALS; MASS SPECTROMETERS; OPTICS; SPUTTERING; THIN FILMS;

ELECTRON CYCLOTRON WAVE RESONANCE (ECWR); HIGH-RESOLUTION DEPTH; INSULATING THIN FILMS; SECONDARY NEUTRAL MASS SPECTROMETRY (SNMS);

OPTICAL RESOLVING POWER;

EID: 18844375561     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2275-5     Document Type: Article

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