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1
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0033697537
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Modeling the effects of excimer laser bandwidths on lithographic performance
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A. Kroyan, J. Bendik, O. Semprez, N. Farrar, C. Rowan, and C. Mack, "Modeling the effects of excimer laser bandwidths on lithographic performance," Proc. SPIE 4000, 658-664 (2000).
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(2000)
Proc. SPIE
, vol.4000
, pp. 658-664
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Kroyan, A.1
Bendik, J.2
Semprez, O.3
Farrar, N.4
Rowan, C.5
MacK, C.6
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2
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0035758816
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Effects of 95% intergral vs. FWHM bandwidth specifications on lithographic imaging
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A. Kroyan, I. Lalovic, and N. Farrar, "Effects of 95% intergral vs. FWHM bandwidth specifications on lithographic imaging," Proc. SPIE 4346, 1244-1253 (2001).
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(2001)
Proc. SPIE
, vol.4346
, pp. 1244-1253
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Kroyan, A.1
Lalovic, I.2
Farrar, N.3
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3
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0035768142
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Contribution of polychromatic illumination to optical proximity effects in the context of deep-UV lithography
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A. Kroyan, I. Lalovic, and N. Farrar, "Contribution of polychromatic illumination to optical proximity effects in the context of deep-UV lithography," Proc. SPIE 4562, 1112 (2002).
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(2002)
Proc. SPIE
, vol.4562
, pp. 1112
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Kroyan, A.1
Lalovic, I.2
Farrar, N.3
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4
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84903048692
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Chromatic aberration impacts on 0.68NA KrF lithographic imaging
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K. Lai, B. Fair, C. Progler, D. Ames, I. Lalovic, A. Kroyan, N. Farrar, K. Ahmed, "Chromatic aberration impacts on 0.68NA KrF lithographic imaging," Contribution to the Arch Interface Microlithography Symp. (2001).
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(2001)
Contribution to the Arch Interface Microlithography Symp.
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Lai, K.1
Fair, B.2
Progler, C.3
Ames, D.4
Lalovic, I.5
Kroyan, A.6
Farrar, N.7
Ahmed, K.8
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5
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3843105089
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Understanding chromatic aberration impacts on lithographic imaging
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K. Lai, I. Lalovic, B. Fair, A. Kroyan, C. Progler, N. Farrar, D. Ames, and K. Ahmed, "Understanding chromatic aberration impacts on lithographic imaging," JM3, 2, 105-111 (2003).
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(2003)
JM3
, vol.2
, pp. 105-111
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Lai, K.1
Lalovic, I.2
Fair, B.3
Kroyan, A.4
Progler, C.5
Farrar, N.6
Ames, D.7
Ahmed, K.8
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6
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33745790897
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Laser bandwidth and other sources of focus blur in lithography
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T. Brunner, D. Corliss, S. Butt, T. Wiltshire, C. P. Ausschnitt, and M. Smith, "Laser bandwidth and other sources of focus blur in lithography," Proc. SPIE 6154, 61540V-1-8 (2006).
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(2006)
Proc. SPIE
, vol.6154
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Brunner, T.1
Corliss, D.2
Butt, S.3
Wiltshire, T.4
Ausschnitt, C.P.5
Smith, M.6
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7
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33745783315
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Effects of laser bandwidth on OPE in a modern on lithographic tool
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K. Huggins, T. Tsuyoshi, M. Ong, R. Rafac, C. Treadway, D. Choudhary, T. Kudo, S. Hirukawa, S. Renwick, and N. Farrar, "Effects of laser bandwidth on OPE in a modern on lithographic tool," Proc. SPIE 6154, 61540Z-1-12 (2006).
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(2006)
Proc. SPIE
, vol.6154
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Huggins, K.1
Tsuyoshi, T.2
Ong, M.3
Rafac, R.4
Treadway, C.5
Choudhary, D.6
Kudo, T.7
Hirukawa, S.8
Renwick, S.9
Farrar, N.10
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8
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42149137004
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Fast and accurate laser bandwidth modeling of optical proximity effects
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I. Lalovic, O. Kritsun, J. Bendik, M. Smith, C. Sallee, and N. Farrar, "Fast and accurate laser bandwidth modeling of optical proximity effects," Proc. SPIE 6730, 67301X-1-14 (2007).
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(2007)
Proc. SPIE
, vol.6730
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Lalovic, I.1
Kritsun, O.2
Bendik, J.3
Smith, M.4
Sallee, C.5
Farrar, N.6
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9
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84903081587
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We try to avoid the more traditional but confusing term "aerialimages" intensity. What we mean with "resist-image" intensity is the image intensity in the resist, just below the resist surface
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We try to avoid the more traditional but confusing term "aerialimages" intensity. What we mean with "resist-image" intensity is the image intensity in the resist, just below the resist surface.
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10
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84903053450
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Commercial simulators, such as PROLITH™ (as of version 9.3.1), now allow the user to directly input the Fλ value and a corresponding laser spectrum file, generated from laser spectrometry data, which is accessible to the laser manufacturer
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Commercial simulators, such as PROLITH™ (as of version 9.3.1), now allow the user to directly input the Fλ value and a corresponding laser spectrum file, generated from laser spectrometry data, which is accessible to the laser manufacturer.
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11
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25144452269
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RELAX: Resolution enhancement by laser-spectrum adjusted exposure
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DOI 10.1117/12.601002, 42, Optical Microlithography XVIII
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I. Lalovic, N. Farrar, K. Takahashi, E. Kent, D. Colon, G. Rylov, A. Acheta, K. Toyoda, and H. Levinson, "RELAX: Resolution Enhancement by laser-spectrum adjusted exposure," Proc. SPIE 5754, 447-455 (2005). (Pubitemid 41336173)
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(2005)
Proceedings of SPIE - The International Society for Optical Engineering
, vol.5754
, Issue.PART 1
, pp. 447-455
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Lalovic, I.1
Farrar, N.2
Takahashi, K.3
Kent, E.4
Colon, D.5
Rylov, G.6
Acheta, A.7
Toyoda, K.8
Levinson, H.9
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13
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84903038566
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See, e.g., 〈http://en.wikipedia.org/wiki/Linear-regression〉
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