RELAX: Resolution enhancement by laser-spectrum adjusted exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 447-455

  Lalovic, Ivan ^a,e   Farrar, Nigel ^b   Takahashi, Kazuhiro ^c   Kent, Eric ^a   Colon, Daniel ^b   Rylov, German ^b   Acheta, Alden ^a   Toyoda, Koji ^d   Levinson, Harry ^a  

^a ADVANCED MICRO DEVICES   (United States)

^b CYMER INC   (United States)

^c CANON INC   (Japan)

^d NEC Corporation of America   (United States)

^e Takumi Technology Corporation   (United States)

Author keywords

Depth of focus; Excimer lasers; Lithography; Resolution enhancement

Indexed keywords

DEPTH OF FOCUS; DOSE ADJUSTMENTS; FLEX-BASED TECHNIQUES; RESOLUTION ENHANCEMENT;

COMPUTER SIMULATION; IMAGING TECHNIQUES; LIGHT SOURCES; MASKS; METRIC SYSTEM; PHOTOLITHOGRAPHY; WAVEFRONTS;

EXCIMER LASERS;

EID: 25144452269     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601002     Document Type: Conference Paper

References (5)

1. H. Fukuda et al., Improvement of defocus tolerance in a half-micron optical lithography by the focus latitude enhancement exposure method: Simulation and experiment, J. Vac. Sci. Technol. B7 (4), 1989.
2. I. Lalovic et al., Effects of illumination spectral width on mask error enhancement factor and iso-dense bias in 0.6NA KrF imaging, presented at BACUS XXI Phot. Tech. Symp., Oct. 2-5, 2001.
3. A. Kroyan et al., Modeling the effects of excimer laser bandwidths on lithographic performance, Proc. SPIE Optical Microlithography XIV 4000, 658 (2000).
4. I. Lalovic et al., Depth of focus enhancement by wavelength modulation: Can we RELAX and improve focus latitude?, presented at Arch Chemical 2003 INTERFACE Symposium, San Diego, CA, Sept 21-23, 2003.
5. K.Lai et al., Understanding chromatic aberration impacts on lithographic imaging, J. Microlithography, Microfabrication and Microsystems, Vol. 2, Issue 2, pp. 105-111, 2003