Vacuum induced photoresist outgassing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Waterman, Justin ^a   Mbanaso, Chimaobi ^a   Denbeaux, Gregory ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

EUV lithography; Outgassing; Photoresist

Indexed keywords

EXPOSURE TOOL; EXTREME ULTRAVIOLETS; FEATURE SIZES; IN-VACUUM; SIMILAR NUMBERS;

EXTREME ULTRAVIOLET LITHOGRAPHY; INVESTMENTS; LITHOGRAPHY; OPTICS; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; VACUUM; VACUUM TECHNOLOGY;

DEGASSING;

EID: 65849306783     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772701     Document Type: Conference Paper

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