APF® pitch-halving for 22nm logic cells using gridded design rules

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6925, Issue , 2008, Pages

  Smayling, Michael C ^a   Bencher, Christopher ^b   Chen, Hao D ^b   Dai, Huixiong ^b   Duane, Michael P ^b  

^a Tela Innovations Inc   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

Advanced patterning film; APF; Double patterning; GDR; Gridded design rules; Restricted design rules; SADP; SaDPT; Spacer mask

Indexed keywords

DIELECTRIC MATERIALS; FREQUENCY DOUBLERS; LOGIC DESIGN; MASKS; PATTERN MATCHING;

ADVANCED PATTERNING FILMS; DOUBLE PATTERNING; GRIDDED DESIGN RULES; RESTRICTED DESIGN RULES; SPACER MASKS;

LOGIC DEVICES;

EID: 43249083986     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772905     Document Type: Conference Paper

References (10)

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