Comparison of the optical and structural properties of nickel oxide-based thin films obtained by chemical bath and sputtering

Thin Solid Films

Volumn 517, Issue 10, 2009, Pages 3115-3120

  Mendoza Galvan A ^a   Vidales Hurtado, M A ^a   Lopez Beltran A M ^a,b  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

^b UNIVERSIDAD AUTÓNOMA DE SINALOA   (Mexico)

Author keywords

Chemical deposition; Nickel oxide; Optical properties; Sputtering

Indexed keywords

ATMOSPHERIC TEMPERATURE; COLOR FILMS; HYDROGEN; NICKEL; NICKEL ALLOYS; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; SURFACE STRUCTURE; THIN FILMS; VACANCIES;

CHEMICAL BATHS; CHEMICAL DEPOSITION; CHEMICAL ROUTES; CHEMICAL-BATH DEPOSITIONS; CRYSTALLINITY; FLUX RATIOS; HIGHER TEMPERATURES; LOW CRYSTALLINITY; NANO-POROUS STRUCTURES; NICKEL OXIDE THIN FILMS; POLYCRYSTALLINE FILMS; ROOM TEMPERATURES; SPECIFIC SURFACES; SPUTTERED FILMS; SUBSTRATE TEMPERATURES; VISIBLE RANGES;

OPTICAL FILMS;

EID: 61449126000     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.094     Document Type: Article

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