Supermagnetron plasma CVD of highly effective a-CNx:H electron-transport and hole-blocking films suited to Au/a-CNx:H/p-Si photovoltaic cells

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4218-4221

  Kinoshita, Haruhisa ^a   Kiyama, Makoto ^a   Suzuki, Hiroyuki ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

a CNx:H; Amorphous carbon; Chemical vapor deposition; Photovoltaic cell

Indexed keywords

A-CNX:H; ELECTRON TRANSPORTS; HIGHEST ENERGY CONVERSION EFFICIENCIES; HOLE-BLOCKING; HYDROGENATED CARBONS; RF-POWER; SI WAFERS; SUPERMAGNETRON PLASMAS;

AMORPHOUS CARBON; AMORPHOUS FILMS; CELL MEMBRANES; CHEMICAL VAPOR DEPOSITION; CONVERSION EFFICIENCY; ELECTRON TRANSPORT PROPERTIES; ENERGY CONVERSION; NITRIDES; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; VAPORS;

CARBON NITRIDE;

EID: 65449160852     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.006     Document Type: Article

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