Electrochemical Au deposition on stepped Si(1 1 1)-H surfaces: 3D versus 2D growth studied by AFM and X-ray diffraction

Surface Science

Volumn 603, Issue 9, 2009, Pages 1212-1220

  Warren, S ^a   Prod'homme, P ^b   Maroun, F ^b   Allongue, P ^b   Cortes R ^b   Ferrero, C ^a   Lee, T L ^a   Cowie, B C C ^a   Walker, C J ^a   Ferrer, S ^a   Zegenhagen, J ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

AFM; Electrochemical deposition; Gold; Silicon; X ray diffraction

Indexed keywords

2D GROWTHS; AFM; ATOMIC FORCES; AU FILMS; AU ISLANDS; AU(1 1 1 ); CHLORIDE SOLUTIONS; CYANIDE SOLUTIONS; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL GROWTHS; FILM MORPHOLOGIES; FLAT TOPS; GOLD LAYERS; MAGNETIC LAYERS; NON-MAGNETIC; NUCLEATION AND GROWTHS; PERPENDICULAR MAGNETIC ANISOTROPIES; PT (1 1 1); SI (1 1 1); SILICIDE FORMATIONS; SILICON SUBSTRATES; SOLUTION COMPOSITIONS; STEP EDGES; SURFACE BONDS; X-RAY DIFFRACTION MEASUREMENTS;

ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; CHLORINE COMPOUNDS; COBALT; CRYSTAL GROWTH; CYANIDES; DIFFRACTION; ELECTRODEPOSITION; EPITAXIAL GROWTH; EPITAXIAL LAYERS; FILM GROWTH; GOLD DEPOSITS; HYDROGEN; MAGNETIC ANISOTROPY; OPTICAL WAVEGUIDES; PLATINUM; REDUCTION; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; SINGLE CRYSTALS; THREE DIMENSIONAL; TWO DIMENSIONAL; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

GOLD;

EID: 65249139393     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2009.03.004     Document Type: Article

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