Properties of films of multilayered ZnO:Al and ZnO deposited by an alternating sputtering method

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 160-163

  Tominaga, K ^a   Murayama, T ^a   Umezu, N ^a   Mori, I ^a   Ushiro, T ^a   Moriga, T ^a   Nakabayashi, I ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Alternating sputtering; Multilayered film; ZnO:Al

Indexed keywords

CARRIER CONCENTRATION; CARRIER MOBILITY; CRYSTAL STRUCTURE; FILM PREPARATION; HALL EFFECT; MULTILAYERS; SPUTTER DEPOSITION; ZINC OXIDE;

ALTERNATING SPUTTERING METHOD; HALL MOBILITY; MULTILAYERED FILMS;

SUPERCONDUCTING FILMS;

EID: 0032671885     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01653-8     Document Type: Article

References (4)

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