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Volumn 69, Issue 5-6, 2008, Pages 1334-1337

Effects of O2 addition on microstructure and electrical property for ITO films deposited with several kinds of ITO targets

Author keywords

A. Thin films; B. Plasma deposition; D. Electrical properties; D. Optical properties

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; MAGNETRON SPUTTERING; MICROSTRUCTURE; X RAY DIFFRACTION;

DENSITY TARGETS; LOW RESISTIVITY FILM; MICRO-ARCING;

THIN FILMS;

EID: 43649105636 PISSN: 00223697 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpcs.2007.10.123 Document Type: Article

Times cited : (22)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.