Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3472-3475

  Ohdaira, Keisuke ^a   Shiba, Kazuhiro ^a   Takemoto, Hiroyuki ^a   Fujiwara, Tomoko ^a   Endo, Yohei ^a   Nishizaki, Shogo ^a   Jang, Young Rae ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Adhesion; Catalytic CVD; Dehydrogenation; Flash lamp annealing; Glass substrate; Hydrogen content; Plasma enhanced CVD; Polycrystalline Si

Indexed keywords

CATALYTIC CVD; FLASH LAMP ANNEALING; GLASS SUBSTRATE; HYDROGEN CONTENT; PLASMA-ENHANCED CVD; POLYCRYSTALLINE SI;

ADHESION; AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; DEHYDROGENATION; ELECTRODEPOSITION; GLASS; HYDROGEN; PLASMA DEPOSITION; PLASMAS; POLYSILICON; SUBSTRATES; THICKNESS MEASUREMENT;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 64349116727     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.075     Document Type: Article

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