A comparison of grain nucleation and grain growth during crystallization of HWCVD and PECVD a-Si:H films

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 529-532

  Mahan, A H ^a   Ahrenkiel, S P ^a   Schropp, R E I ^b   Li, H ^b   Ginley, D S ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Annealing; Crystallite nucleation; Crystallization kinetics; Hydrogenated amorphous silicon; Nuclear magnetic resonance

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION KINETICS; GRAIN GROWTH; MATHEMATICAL MODELS; NUCLEAR MAGNETIC RESONANCE;

CRYSTALLITE NUCLEATION; HYDROGEN CONTENTS;

THIN FILMS;

EID: 36749052233     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.036     Document Type: Article

References (22)

1. Iverson R.B., and Reif R. J. Appl. Phys. 62 (1987) 1675
2. Lee J.N., Lee B.J., Moon D.G., and Ahn B.T. Jpn. J. Appl. Phys. 36 (1997) 6862
3. Nakazawa K., and Tanaka K. J. Appl. Phys. 68 (1990) 1029
4. Young D.L., Stradins P., Iwaniczko E., To B., Reedy B., Yan Y., Branz H.M., Lohr J., Alvarz M., Booske J., Marconnet A., and Wang Q. MRS Symp. Proc. 862 (2005) 233
5. Mahan A.H., Roy B., Reedy Jr. R.C., Readey D.W., and Ginley D.S. J. Appl. Phys. 99 (2006) 023507
6. Mahan A.H., Carapella J., Nelson B.P., Crandall R.S., and Balberg I. J. Appl. Phys. 69 (1991) 6728
7. H ∼ 12 at.%
8. A.H. Mahan, S.P. Ahrenkiel, B.Roy, R.E.I. Schropp, H. Li, D.S. Ginley, Proc. WCPEC4 (Hawaii, May 2006), in press.
9. S.P. Ahrenkiel, A.H. Mahan, B.Roy, D.S. Ginley, Proc. 2006 MRS Spring Conference (Symposium A) (San Francisco, May 2006), in press.
10. Beeman D., Tsu R., and Thorpe M.F. Phys. Rev. B 32 (1985) 874
11. Wu Y., Stephen J.T., Han D.X., Rutland J.M., Crandall R.S., and Mahan A.H. Phys. Rev. Lett. 77 (1996) 2049
12. Reimer J.A., Vaughan R.W., and Knights J.C. Phys. Rev. B 24 (1981) 3360
13. Gleason K.K., Petrich M.A., and Reimer J.A. Phys. Rev. B 36 (1987) 3259
14. Carlos W.E., and Taylor P.C. Phys. Rev. B 26 (1982) 3605
15. Baum J., Gleason K.K., Pines A., Garroway A.N., and Reimer J.A. Phys. Rev. Lett. 56 (1986) 1377
16. Spinella C., Lombardo S., and Priolo F. J. Appl. Phys. 84 (1998) 5383
17. Tu K.N. Appl. Phys. A 53 (1991) 32
18. Britton D.T., Hempel A., Harting M., Kogel G., Sperr P., Triftshauser W., Arendse C., and Knoesen D. Phys. Rev. B 64 (2001) 075403
19. Williamson D.L. MRS Symp. Proc. 557 (1999) 251
20. Mahan A.H., Gedvilas L.M., and Webb J.D. J. Appl. Phys. 87 (2000) 1650
21. R.W. Readey, private communication.
22. Voutsas A.T., and Hatalis M.K. J. Electrochem. Soc. 140 (1993) 871